Published in
Institute of Electrical and Electronics Engineers, IEEE Electron Device Letters, 1(39), p. 87-90
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Impact of Plasma Treatment on Reliability Performance for HfZrOx-Based Metal-Ferroelectric-Metal Capacitors
Journal article published in 2018 by
Kuen-Yi Chen,
Pin-Hsuan Chen,
Ruei-Wen Kao,
Yan-Xiao Lin,
Yung-Hsien Wu 
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