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IOP Publishing, Materials Research Express, 9(5), p. 095903

DOI: 10.1088/2053-1591/aad591

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The effects of ICP dry etching and HF wet etching on the morphology of SiO2 surface

This paper was not found in any repository, but could be made available legally by the author.
This paper was not found in any repository, but could be made available legally by the author.

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