Novel N/PFET Vt control by TiN plasma nitridation for aggressive gate scaling
Proceedings article published in 2016 by
M. Togo,
W. H. Tong,
X. Zhang,
D. H. Triyoso,
J. Lian,
Y. Mamy Randriamihja,
S. Uppal,
S. Dag,
E. C. Silva,
M. Kota,
T. Shimizu,
S. Patil,
M. Eller,
S. Samavedam
